{"data":{"id":"us/40-cfr-table-i-8-to-subpart-i-of-part-98","jurisdiction":"us","citation":"40 CFR Table I-8 to Subpart I of Part 98","heading":"Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2O,j) for N2O Utilization (UN2O,j)","body":"Table I-8 to Subpart I of Part 98—Default Emission Factors (1-UN2 O,j) for N2 O Utilization (UN2 O,j)\nManufacturing type/process type/wafer size N2 O\nSemiconductor Manufacturing:\n200 mm or Less:\nCVD 1-Ui 1.0\nOther Manufacturing Process 1-Ui 1.0\n300 mm or greater:\nCVD 1-Ui 0.5\nOther Manufacturing Process 1-Ui 1.0\nLCD Manufacturing:\nCVD Thin Film Manufacturing 1-Ui 0.63\nAll other N2 O Processes 1.0","path":["Title 40—Protection of Environment","CHAPTER I—ENVIRONMENTAL PROTECTION AGENCY","SUBCHAPTER C—AIR PROGRAMS","PART 98—MANDATORY GREENHOUSE GAS REPORTING","Subpart I—Electronics Manufacturing"],"source_url":"https://www.ecfr.gov/api/versioner/v1/full/2026-08-25/title-40.xml","current_through":"2026-08-25","vintage":"","retrieved_at":"2026-08-27T02:26:04Z","sha256":"03377908c28feb73fbb3aac3ccb99a4817406d3ee7ba5faae9c3fc408b593402","source_id":"us-cfr","stale":true,"prev":"us/40-cfr-table-i-7-to-subpart-i-of-part-98","next":"us/40-cfr-table-i-9-to-subpart-i-of-part-98"},"notice":"GroundRules: Original legal text. Not legal advice."}