40 CFR Table I-11 to Subpart I of Part 98: Table I-11 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-11 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

[150 mm and 200 mm Wafers]

All processes Process gas i

CF4 C2 F6 CHF3 CH2 F2 C2 HF5 CH3 F C3 F8 C4 F8 NF3 NF3 Remote SF6 C4 F6 C5 F8 C4 F8 O

1-Ui 0.79 0.55 0.51 0.13 0.064 0.70 0.40 0.12 0.18 0.028 0.58 0.083 0.072 0.14

BCF4 NA 0.19 0.085 0.079 0.077 NA 0.20 0.11 0.11 0.015 0.13 0.095 NA 0.13

BC2 F6 0.027 NA 0.035 0.025 0.024 0.0034 NA 0.019 0.0059 NA 0.10 0.073 0.014 0.045

BC4 F8 NA NA NA NA NA NA NA NA NA NA NA NA NA NA

BC3 F8 NA NA NA NA NA NA NA NA NA NA NA NA NA NA

BC5 F8 0.00077 NA 0.0012 NA NA NA NA 0.0043 NA NA NA NA NA NA

BCHF3 0.060 0.0020 NA 0.049 NA NA NA 0.020 NA NA 0.0011 0.066 0.0039 NA

BF2 NA NA NA NA NA NA NA NA NA 0.50 NA NA NA NA

Notes: NA = Not applicable; i.e., there are no applicable emission factor measurements for this gas. This does not necessarily imply that a particular gas is not used in or emitted from a particular process sub-type or process type.