40 CFR Table I-12 to Subpart I of Part 98: Table I-12 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

Table I-12 to Subpart I of Part 98—Default Emission Factors (1-Uij) for Gas Utilization Rates (Uij) and By-Product Formation Rates (Bijk) for Semiconductor Manufacturing for Use With the Stack Test Method

[300 mm and 450 mm Wafers]

All processes Process gas i

CF4 C2 F6 CHF3 CH2 F2 CH3 F C3 F8 C3 F8 Remote C4 F8 NF3 NF3 Remote SF6 C4 F6 C5 F8 C4 F8 O

1-Ui 0.65 0.80 0.37 0.20 0.30 0.30 0.063 0.183 0.19 0.018 0.30 0.15 0.100 NA

BCF4 NA 0.21 0.076 0.060 0.029 0.21 NA 0.045 0.040 0.037 0.033 0.059 0.109 NA

BC2 F6 0.058 NA 0.058 0.043 0.0093 0.18 NA 0.027 0.0204 NA 0.041 0.062 0.083 NA

BC4 F6 0.0083 NA 0.01219 NA 0.001 NA NA 0.008 NA NA NA NA NA NA

BC4 F8 0.0046 NA 0.00272 0.054 0.007 NA NA NA NA NA NA 0.0051 NA NA

BC3 F8 NA NA NA NA NA NA NA NA NA NA NA NA 0.00012 NA

BCH2 F2 0.005 NA 0.0024 NA 0.0033 NA NA 0.0021 0.00034 0.00088 0.000020 0.000030 NA NA

BCH3 F 0.0061 NA 0.027 0.0036 NA 0.0007 NA 0.0063 0.0036 0.0028 0.0082 0.00065 NA NA

BCHF3 0.012 NA NA 0.057 0.016 0.012 NA 0.028 0.0106 0.000059 0.0039 0.017 0.0069 NA

BF2 NA NA NA NA NA NA NA NA NA 0.50 NA NA NA NA